Photoluminescence studies of implantation damage centers in Si-30

S Hayama, G Davies, K M Itoh

Research output: Contribution to journalArticlepeer-review

24 Citations (Scopus)

Abstract

We report photoluminescence (PL) studies of implant-damage centers in Si-30. The X and W zero-phonon lines (ZPLs) shift by +1.55(5) and +1.27(5) meV, respectively, between Si-nat and Si-30. Using a simple empirical approach, we calculate the shifts to within similar to20%. Local vibrational modes are identified at the X center and confirmed at the W center, supporting the assignment of these centers to self-interstitial clusters. All the strong PL lines produced by ion implantation in the sample have isotope shifts characteristic of ZPLs; they all correspond to independent defect centers, the majority of which have undetermined structures. (C) 2004 American Institute of Physics.
Original languageEnglish
Pages (from-to)1754 - 1756
Number of pages3
JournalJournal of Applied Physics
Volume96
Issue number3
DOIs
Publication statusPublished - 1 Aug 2004

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